In this thesis , we have mainly studied the characteristics of chf3 , c6h6 and cf4 electron cyclotron resonance ( ecr ) plasma using langmuir probe and optical emission spectroscopy ( oes ) . the relative concentration of different radicals in chf3 plasma and the effect of chf3 / c6h6 ratio on bond configuration of a - c : f films were discussed . it was showed that h , f , c2 were the main radicals among radicals of h , f , c2 , ch and f2 in chf3 ecr plasma 重点研究了chf _ 3 、 cf _ 4和chf _ 3 c _ 6h _ 6放电等离子体中基团的分布;分析了不同基团的相对密度随宏观放电条件(微波输入功率、放电气压、源气体流量比)的变化规律;探讨了等离子体中各种基团的生成途径;在不同源气体流量比的条件下沉积了a - c : f薄膜并通过傅立叶变化红外吸收光谱( ftir )的测量得到了薄膜中键结构的信息;分析了a - c : f薄膜的沉积速率及其键结构与等离子体空间基团分布状态之间的关联。